The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2018
Filed:
Nov. 21, 2014
Slm Solutions Group Ag, Luebeck, DE;
Dieter Schwarze, Luebeck, DE;
Andreas Wiesner, Luebeck, DE;
SLM Solutions Group AG, Luebeck, DE;
Abstract
A method for controlling an irradiation system () for use in an apparatus () for producing a three-dimensional work piece and comprising a plurality of irradiation units () a first and a second irradiation area () as well as an overlap area () arranged between the first and the second irradiation area () is defined on a surface of a carrier () adapted to receive a layer of raw material powder. A first irradiation area () of the irradiation system () is assigned to the first irradiation area () and the overlap area (), and a second irradiation unit () of the irradiation system () is assigned to the second irradiation area () and the overlap area (). If it is determined that a section (S) or a radiation pattern according to which radiation beams () emitted by the irradiation units () of the irradiation system () are guided over the layer of raw material powder received on the carrier () and/or a contour (C) of the three-dimensional work piece to be produced extend(s) into the first and the second irradiation area () defined on the surface of the carrier (), said section (S) of the radiation pattern and/or said contour (C), in a splitting region of the section (S) of the radiation pattern and/or the contour (C) which is located in the overlap area () arranged between the first and the second irradiation area (), is split into a first portion (S, C) and a second portion (S, C). The first portion (S, C) of said section (S) of the radiation pattern and/or said contour (C) is assigned to the first irradiation unit () and the second portion (S, C) of said section (S) of the radiation pattern and/or said contour (C) is assigned to the second irradiation unit ().