The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 23, 2018

Filed:

Dec. 12, 2016
Applicant:

Toshiba Memory Corporation, Minato-ku, JP;

Inventor:

Kimitoshi Okano, Yokkaichi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 27/11582 (2017.01); H01L 27/11556 (2017.01); H01L 23/528 (2006.01); H01L 23/532 (2006.01);
U.S. Cl.
CPC ...
H01L 27/11582 (2013.01); H01L 23/5283 (2013.01); H01L 23/53257 (2013.01); H01L 27/11556 (2013.01);
Abstract

A semiconductor device comprises a channel body, a pair of source drain regions provided on the channel body and a gate electrode provided above a part of the channel body between the source drain regions. The semiconductor device further comprises a first insulating layer covering the source drain regions and the gate electrode; contact bodies extending in the first insulating layer electrically connected to the source drain regions respectively; and a silicide layer provided between one of the source drain regions and one of the contact bodies electrically connected thereto. The one of the contact bodies includes a main part extending in the first insulating layer, and an expanded portion expanded along a surface of the one of the source drain regions; and the silicide layer is positioned between the expanded portion and the one of the source drain regions.


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