The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 23, 2018
Filed:
Sep. 13, 2013
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Korea Advanced Institute of Science and Technology, Daejeon, KR;
Jae-moon Jo, Gyeonggi-do, KR;
Hyun-wook Park, Daejeon, KR;
Yoo-jin Lee, Daejeon, KR;
Ye-Ji Han, Daejeon, KR;
Samsung Electronics Co., Ltd., Yeongtong-gu, Suwon-si, Gyeonggi-do, KR;
Korea Advanced Institute of Science and Technology, Yuseong-gu, Daejeon, KR;
Abstract
A method of generating a susceptibility weighted image of an object in a magnetic resonance imaging (MRI) apparatus includes: acquiring at least one first complex data piece corresponding to a radio frequency (RF) signal received from the object by using the RF signal; applying a predetermined filter to the at least one first complex data piece to acquire at least one second complex data piece; generating a susceptibility weighted mask by using the at least one second complex data piece; and applying the susceptibility weighted mask to an MRI image of the object to generate the susceptibility weighted image.