The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 23, 2018

Filed:

Mar. 10, 2014
Applicant:

Mitsubishi Electric Corporation, Chiyoda-ku, JP;

Inventors:

Shoyu Watanabe, Tokyo, JP;

Akihiro Koyama, Tokyo, JP;

Shigehisa Yamamoto, Tokyo, JP;

Yukiyasu Nakao, Tokyo, JP;

Kazuya Konishi, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 31/26 (2014.01); H01L 21/66 (2006.01); H01L 29/16 (2006.01); H01L 29/32 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); G01R 31/28 (2006.01); H01L 21/56 (2006.01);
U.S. Cl.
CPC ...
G01R 31/2632 (2013.01); G01R 31/2648 (2013.01); G01R 31/2855 (2013.01); G01R 31/2877 (2013.01); H01L 21/565 (2013.01); H01L 22/14 (2013.01); H01L 29/1608 (2013.01); H01L 29/32 (2013.01); H01L 29/66068 (2013.01); H01L 29/7805 (2013.01); H01L 2924/0002 (2013.01);
Abstract

The present invention provides a method for manufacturing silicon carbide semiconductor apparatus including a testing step of testing a PN diode for the presence or absence of stacking faults in a relatively short time and an energization test apparatus. The present invention sets the temperature of a bipolar semiconductor element at 150° C. or higher and 230° C. or lower, causes a forward current having a current density of 120 [A/cm] or more and 400 [A/cm] or less to continuously flow through the bipolar semiconductor element, calculates, in a case where a forward resistance of the bipolar semiconductor element through which the forward current flows reaches a saturation state, the degree of change in the forward resistance, and determines whether the calculated degree of change is smaller than a threshold value.


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