The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 23, 2018
Filed:
Apr. 26, 2013
Applied Materials, Inc., Santa Clara, CA (US);
Neil Morrison, Darmstadt, DE;
Jose Manuel Dieguez-Campo, Hanau, DE;
Heike Landgraf, Bruchkobel, DE;
Tobias Stolley, Oberursel, DE;
Stefan Hein, Blankenbach, DE;
Florian Ries, Westerngrund, DE;
Wolfgang Buschbeck, Hanau, DE;
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
An apparatus includes a substrate support having an outer surface for guiding the substrate through a first vacuum processing region and at least one second vacuum processing region. First and second deposition sources correspond to the first processing region and at least one second deposition source corresponds to the at least one second vacuum processing region, wherein at least the first deposition source includes an electrode having a surface that opposes the substrate support. A processing gas inlet and a processing gas outlet are arranged at opposing sides of the surface of the electrode. At least one separation gas inlet how one or more openings, wherein the one or more openings are at least provided at one of opposing sides of the electrode surface such that the processing gas inlet and/or the processing gas outlet are provided between the one or more openings and the surface of the electrode.