The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 23, 2018

Filed:

May. 06, 2016
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Naozumi Fujiwara, Kyoto, JP;

Naoko Yamaguchi, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/00 (2006.01); B08B 7/00 (2006.01); H01L 21/02 (2006.01); B08B 3/08 (2006.01); B08B 3/02 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
B08B 7/0071 (2013.01); B08B 3/02 (2013.01); B08B 3/08 (2013.01); H01L 21/02057 (2013.01); H01L 21/6715 (2013.01); H01L 21/67051 (2013.01);
Abstract

A large number of pattern elements stands upright on an upper surface of a substrate. After the upper surface of the substrate has been processed using a processing liquid, liquid filling processing for filling the upper surface with a filler solution is performed, in which the filler solution having a viscosity of three centipoises or more is applied to a central part of the upper surface. Then, by rotating the substrate at 1000 revolutions per minute or less, the processing solution adhering to the entire upper surface is replaced by the filler solution, and a solution layer of a predetermined thickness is formed. In this way, making the viscosity of the filler solution relatively high and making the centrifugal force acting at the time of rotating the substrate relatively low suppresses deformation of the pattern elements at the time of filling with a filler that uses the filler solution.


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