The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 23, 2018

Filed:

Aug. 16, 2013
Applicant:

The Regents of the University of California, Oakland, CA (US);

Inventors:

Zuzanna S. Siwy, Irvine, CA (US);

Ivan V. Vlassiouk, Oak Ridge, TN (US);

Pavel Yu Apel, Moscow Region, RU;

Sergey N. Dmitriev, Moscow Region, RU;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B01D 67/00 (2006.01); B01D 61/14 (2006.01); B01D 61/18 (2006.01); B01D 71/02 (2006.01);
U.S. Cl.
CPC ...
B01D 67/0062 (2013.01); B01D 61/14 (2013.01); B01D 61/18 (2013.01); B01D 71/02 (2013.01);
Abstract

A method for fabricating isolated pores in an inorganic membrane includes the steps of patterning the inorganic membrane to selectively expose a portion of the membrane, forming a plurality of tracks of material damage in the exposed portion of the inorganic membrane by irradiation with energetic ions, and chemically etching the track damaged material to define the pores through the inorganic membrane with a predetermined geometrically defined cross sectional shape and with a controlled diameter range from less than 1 nanometer and up to micrometer scale.


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