The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2018
Filed:
May. 17, 2016
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Ning Li, White Plains, NY (US);
Devendra K. Sadana, Pleasantville, NY (US);
Jinghui Yang, Los Angeles, CA (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
H01S 5/02 (2006.01); H01S 5/04 (2006.01); H01S 5/34 (2006.01);
U.S. Cl.
CPC ...
H01S 5/021 (2013.01); H01S 5/041 (2013.01); H01S 5/34 (2013.01);
Abstract
A laser structure includes a substrate and a first dielectric layer formed on the substrate. A multi-quantum well is formed on the first dielectric layer and has a plurality of alternating layers. The alternating layers include a dielectric layer having a sub-wavelength thickness and a monolayer of a two dimensional material.