The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2018
Filed:
Dec. 17, 2015
Applicant:
Universal Display Corporation, Ewing, NJ (US);
Inventors:
Siddharth Harikrishna Mohan, Plainsboro, NJ (US);
Paul E. Burrows, Chattaroy, WA (US);
Assignee:
Universal Display Corporation, Ewing, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 51/56 (2006.01); H01L 51/00 (2006.01); C23C 14/24 (2006.01); C23C 14/56 (2006.01); B05B 1/00 (2006.01); H01L 51/50 (2006.01);
U.S. Cl.
CPC ...
H01L 51/56 (2013.01); B05B 1/005 (2013.01); C23C 14/24 (2013.01); C23C 14/56 (2013.01); H01L 51/0005 (2013.01); H01L 51/0013 (2013.01); H01L 51/50 (2013.01);
Abstract
An emissive layer deposited in graded manner using a plurality of nozzles is disclosed. A mixtures ejected from the plurality of nozzles may contain varying concentrations of host-to-dopant material. The nozzles, as disclosed, may be arranged in a sequential manner such that the order of the sequence is based on varying concentration of the host-to-dopant material. The nozzles may be configured to translate relative to an area of a substrate to allow sequential deposition.