The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2018
Filed:
Feb. 15, 2017
Euclid Techlabs Llc, Gaithersburg, IL (US);
Sergey Antipov, Naperville, IL (US);
Yingje Li, Lisle, IL (US);
Chunuang Jing, Naperville, IL (US);
Roman Kostin, Naperville, IL (US);
Jiaqu Qiu, Willowbrook, IL (US);
Dan Wang, Willowbrook, IL (US);
Paul Schoessow, Willowbrook, IL (US);
EUCLID TECHLABS LLC, Solon, OH (US);
Abstract
The present invention provides a technique for constructing compact, high gradient magnetic lenses for charged particle beam focusing. Methods for adjusting the focusing strength of the lenses are provided, based on thermal control, mechanical motion of the magnetic chips within the yoke. The present invention is a method for designing and fabricating permanent magnet focusing elements that are compact, simple to construct, and having a large, adjustable focusing strength. Applications include beamlines for THz radiation sources, free electron lasers, wakefield accelerators and any other charged particle devices that require a compact beamline.