The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2018
Filed:
Feb. 28, 2017
Dow Technology Investments Llc, Midland, MI (US);
Glenn A. Miller, South Charleston, WV (US);
Victoria L. Biedenstein, Eden Prairie, MN (US);
Atul Manilal Shah, London, GB;
Martin Lucas Smidt, London, GB;
David Keith Welch, London, GB;
Dow Technology Investments LLC, Midland, MI (US);
Abstract
The present invention relates generally to hydroformylation processes. In one embodiment, a process of the present invention comprises: (a) contacting CO, H, and at least one olefin under hydroformylation conditions sufficient to form at least one aldehyde product in the presence of a hydroformylation catalyst; (b) removing a product-containing liquid from the reaction zone and sending it to a vaporizer, which comprises a vaporizing zone and a vapor/liquid separation zone, wherein the product-containing liquid, which comprises crude product and catalyst, is heated in the vaporizing zone to form a mixture of gas and catalyst-containing liquid, which mixture is then phase separated in the separation zone, which separation zone has a liquid withdrawal port, a liquid region, a vapor space and a gas-liquid interface, wherein the liquid region comprises at least one divider plate, which optionally contains at least one perforation, wherein at least a portion of at least one divider plate is in proximity to the gas-liquid interface, with the proviso that at least a portion of at least one divider plate is at or below the interface, and wherein the temperature of the catalyst-containing liquid, measured at the liquid withdrawal port, is lower than the temperature of the vapor space.