The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 16, 2018

Filed:

Apr. 26, 2013
Applicant:

Total Marketing Services, Puteaux, FR;

Inventors:

Périne Jaffrennou, Brussels, BE;

Benoit Lombardet, Saint Alban de la Roche, FR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/14 (2006.01); B41J 2/04 (2006.01); B05C 21/00 (2006.01); H01L 31/0224 (2006.01); B41M 5/00 (2006.01); B41J 2/07 (2006.01);
U.S. Cl.
CPC ...
B05C 21/005 (2013.01); B41J 2/14451 (2013.01); H01L 31/022425 (2013.01); B41J 2/07 (2013.01); B41J 2/14104 (2013.01); B41M 5/0023 (2013.01); Y02E 10/50 (2013.01);
Abstract

The invention relates to a die for depositing a conductive fluid onto a substrate, including a structure () for supporting at least one fluid () which is conductive and the viscosity of which sensitive to the radiation from a light source (), in order to deposit said fluid () onto a substrate () so as to form conductive contacts or tracks on the substrate (). The support structure () includes at least one tank () for said conductive fluid, the bottom wall () of which is to be arranged opposite said substrate () during the deposition, and said bottom wall () has perforations for enabling the flow () of said conductive fluid () onto the substrate () when said fluid () is subjected to the radiation () from said light source (), wherein the perforations are formed according to a pattern of the fluid to be deposited onto the substrate (). The die () further comprises an optical plate () having a pattern () pervious to the radiation from said light source (), the optical plate () being impervious to the radiation from said light source () outside said pattern (), while the pattern () pervious to the radiation from said light source on said optical plate () corresponds to a pattern covering the pattern () of the perforations of said support structure.


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