The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9865813 B1

PDF
Full Text
Expired
Date of Patent:
Jan. 09, 2018

Filed:

Nov. 25, 2015
Applicant:

Microchip Technology Incorporated, Chandler, AZ (US);

Inventor:

Paul Fest, Chandler, AZ (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 45/00 (2006.01); H01L 27/24 (2006.01);
U.S. Cl.
CPC ...
H01L 45/1273 (2013.01); H01L 27/2463 (2013.01); H01L 45/08 (2013.01); H01L 45/085 (2013.01); H01L 45/122 (2013.01); H01L 45/16 (2013.01); H01L 45/1675 (2013.01); H01L 45/142 (2013.01); H01L 45/145 (2013.01); H01L 45/146 (2013.01);
Abstract

A method of forming a resistive memory cell, e.g., CBRAM or ReRAM, includes forming a bottom electrode layer, forming an oxide region of an exposed area of the bottom electrode, removing a region of the bottom electrode layer proximate the oxide region to form a bottom electrode having a pointed tip or edge region. An electrically insulating mini-spacer region is formed adjacent the bottom electrode, and an electrolyte region and top electrode are formed over the bottom electrode and mini-spacer element(s) to define a memory element. The memory element defines a conductive filament/vacancy chain path from the bottom electrode pointed tip region to the top electrode via the electrolyte region. The mini-spacer elements decreases the effective area, or 'confinement zone,' for the conductive filament/vacancy chain path, which may improve the device characteristics, and may provide an improvement over techniques that rely on enhanced electric field forces.


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