The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 09, 2018

Filed:

Sep. 27, 2013
Applicant:

Kaneka Corporation, Osaka-shi, Osaka, JP;

Inventors:

Tomomi Meguro, Settsu, JP;

Kenji Yamamoto, Settsu, JP;

Assignee:

KANEKA CORPORATION, Osaka-shi, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/0224 (2006.01); H01L 31/077 (2012.01); H01L 31/0236 (2006.01); H01L 31/0392 (2006.01); H01L 31/0376 (2006.01); H01L 31/18 (2006.01); H01L 31/076 (2012.01); H01L 31/0368 (2006.01); H01L 31/075 (2012.01); H01L 31/0745 (2012.01); H01L 31/0747 (2012.01);
U.S. Cl.
CPC ...
H01L 31/077 (2013.01); H01L 31/02366 (2013.01); H01L 31/022483 (2013.01); H01L 31/03685 (2013.01); H01L 31/03762 (2013.01); H01L 31/03765 (2013.01); H01L 31/03921 (2013.01); H01L 31/075 (2013.01); H01L 31/076 (2013.01); H01L 31/0745 (2013.01); H01L 31/0747 (2013.01); H01L 31/1804 (2013.01); H01L 31/1888 (2013.01); Y02E 10/545 (2013.01); Y02E 10/548 (2013.01);
Abstract

The thin-film photoelectric conversion device of the present invention includes: a transparent electroconductive film having zinc oxide as a main component; a contact layer; a photoelectric conversion unit having a p-type semiconductor layer, an i-type semiconductor layer and an n-type semiconductor layer in this order; and a back electrode layer, in this order, on one main surface of a substrate. The contact layer has an intrinsic crystalline semiconductor layer and a p-type crystalline semiconductor layer in this order from the substrate side, and the intrinsic crystalline semiconductor layer of the contact layer and the transparent electroconductive film are in contact with each other. The p-type crystalline semiconductor layer of the contact layer is preferably a layer having as a main component a silicon alloy selected from the group consisting of a silicon oxide; a silicon nitride; and silicon carbide.


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