The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 09, 2018

Filed:

Feb. 23, 2017
Applicant:

Hyundai Motor Company, Seoul, KR;

Inventors:

Youngkyun Jung, Seoul, KR;

Junghee Park, Suwon, KR;

Dae Hwan Chun, Gyeonggi-do, KR;

JongSeok Lee, Gyeonggi-do, KR;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/16 (2006.01); H01L 21/02 (2006.01); H01L 29/872 (2006.01); H01L 23/535 (2006.01); H01L 21/768 (2006.01); H01L 21/265 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66143 (2013.01); H01L 21/02529 (2013.01); H01L 21/26506 (2013.01); H01L 21/30604 (2013.01); H01L 21/76895 (2013.01); H01L 23/535 (2013.01); H01L 29/1608 (2013.01); H01L 29/872 (2013.01);
Abstract

A Schottky barrier diode includes: an n+ type of silicon carbide substrate; an n− type of epitaxial layer formed on a first surface of the n+ type of silicon carbide substrate; a plurality of p+ regions formed inside the n− type of epitaxial layer; a Schottky electrode formed in an upper portion of the n− type of epitaxial layer of an electrode region; and an ohmic electrode formed on a second surface of the n+ type of silicon carbide substrate, wherein the plurality of p+ regions are formed to be spaced apart from each other at a predetermined interval within the n− type of epitaxial layer.


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