The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2018
Filed:
Jun. 06, 2014
Christoph Mader, Muenster, DE;
Paul Henrich Woebkenberg, Hoelingen, DE;
Joachim Erz, Schwoerstadt, DE;
Stephan Traut, Loerrach Brombach, DE;
Matthias Patz, Bottrop, DE;
Michael Coelle, Schwanstetten, DE;
Stephan Wieber, Karlsruhe, DE;
Patrik Stenner, Hanau, DE;
Janette Klatt, Recklinghausen, DE;
Odo Wunnicke, Muenster, DE;
Christoph Mader, Muenster, DE;
Paul Henrich Woebkenberg, Hoelingen, DE;
Joachim Erz, Schwoerstadt, DE;
Stephan Traut, Loerrach Brombach, DE;
Matthias Patz, Bottrop, DE;
Michael Coelle, Schwanstetten, DE;
Stephan Wieber, Karlsruhe, DE;
Patrik Stenner, Hanau, DE;
Janette Klatt, Recklinghausen, DE;
Odo Wunnicke, Muenster, DE;
Evonik Degussa GmbH, Essen, DE;
Abstract
The present invention relates to a liquid-phase process for producing structured silicon- and/or germanium-containing coatings by the application to a substrate of at least one coating composition, the partial activation of the resulting coating on the coated substrate, and oxidation of non-activated coating on the substrate, to the coats produced by the process and to their use.