The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2018
Filed:
Oct. 31, 2014
Powerchip Technology Corporation, Hsinchu, TW;
Jyun-Da Wu, Taoyuan County, TW;
Shih-Tsung Hsiao, Hsinchu, TW;
Chien-Chung Chen, Hsinchu, TW;
Huang-Wei Wu, Taoyuan County, TW;
Huang-Wen Chen, Hsinchu, TW;
Sheng-Hsiu Peng, Hsinchu County, TW;
Powerchip Technology Corporation, Hsinchu, TW;
Abstract
A process control method is provided for performing a deposition process on a plurality of wafers of a batch. The process control method includes: deciding a placement location of the wafers of the batch according to the history information of a tool and the product information of the batch; calculating a target value of each placement location according to the placement location of the wafers of the batch and the history information of the tool; calculating a process parameter according to the history information of the tool, the product information of the batch, and the target value of each placement location; and performing a deposition process according to the placement location of the wafers of the batch and the process parameter.