The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2018
Filed:
May. 27, 2016
Northwestern University, Evanston, IL (US);
Youwei Yao, Evanston, IL (US);
Melville Paul Ulmer, Evanston, IL (US);
Jian Cao, Wilmette, IL (US);
Xiaoli Wang, Evanston, IL (US);
Northwestern University, Evanston, IL (US);
Abstract
A method of forming a stress distributed coating layer is provided which comprises depositing a coating material emanating from a source at a first location on a backside of an optical substrate at a first bias voltage to provide a first coating region at the first location characterized by a first stress and depositing the coating material at a second location on the backside of the optical substrate at a second bias voltage to provide a second coating region at the second location characterized by a second stress, thereby forming a stress distributed coating layer on the backside of the optical substrate comprising the first and second coating regions. Deposition systems and coated optical substrates are also provided.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile