The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 09, 2018

Filed:

Jan. 23, 2015
Applicants:

Tsinghua University, Beijing, CN;

Hon Hai Precision Industry Co., Ltd., New Taipei, TW;

Inventors:

Jiang-Tao Wang, Beijing, CN;

Tian-Yi Li, Beijing, CN;

Qing-Yu Zhao, Beijing, CN;

Kai-Li Jiang, Beijing, CN;

Shou-Shan Fan, Beijing, CN;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 1/28 (2006.01); G02B 21/24 (2006.01); G01N 15/14 (2006.01); G02B 21/00 (2006.01); G01N 15/06 (2006.01); G01N 15/00 (2006.01);
U.S. Cl.
CPC ...
G01N 1/28 (2013.01); G01N 15/1463 (2013.01); G02B 21/0004 (2013.01); G02B 21/24 (2013.01); G01N 15/065 (2013.01); G01N 2015/0038 (2013.01); G02B 21/00 (2013.01);
Abstract

A method for observing nanostructures by optical microscopy is provided. Firstly, a sample with a nanostructure and a vapor-condensation-assisted optical microscopy system are provided. The vapor-condensation-assisted optical microscopy system comprises a vapor-condensation-assisted device and an optical microscope comprising a stage. The vapor-condensation-assisted device is used to provide a vapor to sample on the stage in application. Secondly, locating the sample is located on the stage. Thirdly, a vapor is applied to the sample to observe the sample via the optical microscopy system.


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