The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2018
Filed:
Mar. 14, 2014
Sio2 Medical Products, Inc., Auburn, AL (US);
Joseph A. Jones, Birmingham, AL (US);
John T. Felts, Alameda, CA (US);
James Troy Gresham, Opelika, AL (US);
Brian Russell Lilly, Auburn, AL (US);
Thomas E. Fisk, Green Valley, AZ (US);
SiO2 Medical Products, Inc., Auburn, AL (US);
Abstract
A method for coating a substrate surface such as a syringe part by PECVD is provided, the method comprising generating a plasma from a gaseous reactant comprising an organosilicon precursor and optionally an oxidizing gas by providing plasma-forming energy adjacent to the substrate, thus forming a coating on the substrate surface by plasma enhanced chemical vapor deposition (PECVD). The plasma-forming energy is applied in a first phase as a first pulse at a first energy level followed by further treatment in a second phase at a second energy level lower than the first energy level. The lubricity, hydrophobicity and/or barrier properties of the coating are set by setting the ratio of the Oto the organosilicon precursor in the gaseous reactant, and/or by setting the electric power used for generating the plasma.