The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2018
Filed:
Jan. 08, 2016
National Taiwan University of Science and Technology, Taipei, TW;
Jeng-Ywan Jeng, Taipei, TW;
Rimma Shafikova, Taipei, TW;
Wei-Nien Su, Taipei, TW;
Bing-Joe Hwang, Taipei, TW;
NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY, Taipei, TW;
Abstract
A method of photo-curing a photo-sensitive resin is disclosed in the present invention. The method includes the following steps: generating a sub-pixel pattern having an outer contour region and an inner contour region based on a vector file taken from a cross-section of a model; providing the sub-pixel pattern to a photomask module, wherein the photomask module includes a panel having a pixel matrix including plural square pixels, each of which includes three color-filtered sub-pixels; flood-filling color in each of the color-filtered sub-pixels to distinguish the outer contour region from the inner contour region; and exposing the photo-sensitive resin to a light source emitting a light passing through the panel.