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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9859360 B1

PDFFull Text
Date of Patent:
Jan. 02, 2018

Filed:

Jun. 16, 2016

Edge termination for semiconductor devices and corresponding fabrication method

Applicant:

Abb Schweiz Ag, Baden, CH;

Inventors:

Marina Antoniou, Cambridge, GB;

Florin Udrea, Cambridge, GB;

Iulian Nistor, Niederweningen, CH;

Munaf Rahimo, Uezwil, CH;

Chiara Corvasce, Bergdietikon, CH;

Assignee:

ABB Schweiz AG, Baden, CH;

Attorney:

Taft Stettinius & Hollister LLP

Primary Examiner:

Vu A Vu

Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/06 (2006.01); H01L 29/40 (2006.01); H01L 29/739 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0619 (2013.01); H01L 29/0623 (2013.01); H01L 29/0661 (2013.01); H01L 29/0696 (2013.01); H01L 29/404 (2013.01); H01L 29/66333 (2013.01); H01L 29/66348 (2013.01); H01L 29/66712 (2013.01); H01L 29/66734 (2013.01); H01L 29/7395 (2013.01); H01L 29/7397 (2013.01); H01L 29/7811 (2013.01); H01L 29/7813 (2013.01);
Abstract

A termination region of an IGBT is described, in which surface p-rings are combined with oxide/polysilicon-filled trenches, buried p-rings and surface field plates, so as to obtain an improved distribution of potential field lines in the termination region. The combination of surface ring termination and deep ring termination offers a significant reduction in the amount silicon area which is required for the termination region.

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Antoniou, Marina. (2018). Edge termination for semiconductor devices and corresponding fabrication method (U.S. Patent No. 9859360). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9859360

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