The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2018
Filed:
Sep. 02, 2016
Applicant:
Toshiba Memory Corporation, Tokyo, JP;
Inventors:
Takeshi Okino, Kanagawa, JP;
Akira Watanabe, Kanagawa, JP;
Naoko Kihara, Kanagawa, JP;
Ryosuke Yamamoto, Kanagawa, JP;
Assignee:
Toshiba Memory Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/027 (2006.01); G03F 7/00 (2006.01); C09K 13/00 (2006.01); B81C 1/00 (2006.01); G11B 5/84 (2006.01); G11B 7/26 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0271 (2013.01); G03F 7/0002 (2013.01); B81C 1/00404 (2013.01); B81C 2201/0149 (2013.01); C09K 13/00 (2013.01); G11B 5/8404 (2013.01); G11B 7/263 (2013.01);
Abstract
A pattern formation method according to an embodiment includes providing a substrate in which protrusions each having a tapered shape are provided on a main surface. The method further includes supplying the main surface with spherical particles equal in diameter to make the spherical particles arrange in a triangular lattice form such that each of the protrusions is at least partially positioned within a region surrounded by the main surface and three of the spherical particles adjacent to one another.