The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2018
Filed:
Sep. 24, 2014
International Business Machines Corporation, Armonk, NY (US);
Anamitra Bhattacharyya, Chelmsford, MA (US);
Krishnamohan Dantam, Chelmsford, MA (US);
Sampathkumar Sriramadhesikan, Burlington, MA (US);
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
Abstract
Impact analysis for business applications can include receiving an event for a business application system, wherein the event specifies a change to an artifact of the business application system, and determining a node of a directed graph to which the event applies as a source node. The directed graph represents the business application system. The directed graph is formed by a plurality of nodes joined by links, wherein each node represents an artifact of the business application system and each link specifies semantic data indicating a dependency between the nodes joined by the link. Impact analysis further includes determining, using a processor, artifact assessment data for a first node connected to the source node through a first link, wherein the artifact assessment data includes a type of an effect of the event upon the first node and a context for the effect.