The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2018
Filed:
Jun. 25, 2014
Lg Chem, Ltd., Seoul, KR;
Byoung Il Kang, Daejeon, KR;
Chang Hun Han, Daejeon, KR;
Jae Bum Seo, Daejeon, KR;
Da Eun Sung, Daejeon, KR;
Dae Woo Lee, Daejeon, KR;
Eun Jung Choi, Daejeon, KR;
LG CHEM, LTD., Seoul, KR;
Abstract
Disclosed is a (meth)acrylate-based resin composition comprising a poly(alkyl(meth)acrylate-phenyl(meth)acrylate) copolymer comprising phenyl(meth)acrylate having excellent surface hardness and a high refractive index, as a base resin and a (conjugated diene (meth)acrylate) graft copolymer having excellent impact absorption efficiency, the (meth)acrylate-based resin composition providing excellent transparency by exhibiting excellent impact resistance even using a small amount of impact modifier. The (meth)acrylate-based resin composition having excellent impact resistance and transparency comprises 1 to 29 wt % of the (conjugated diene-(meth)acrylate) graft copolymer and 71 to 99 wt % of the poly(alkyl(meth)acrylate-phenyl(meth)acrylate) copolymer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile