The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2018
Filed:
Aug. 28, 2014
Fujifilm Corporation, Tokyo, JP;
Tsutomu Umebayashi, Ashigarakami-gun, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
The object of the present invention is to provide an image formation method that can give an image that is excellent in terms of adhesion to a substrate, blocking resistance of a resulting printed material, and molding suitability, in particular vacuum forming properties, and that can suppress post-molding cracking of a molding. Disclosed is an image formation method comprising, in order, Step a: a step of applying Liquid A to a substrate, Step b: a step of irradiating the applied Liquid A with actinic radiation so as to carry out complete curing or semi-curing up to a degree of cure of at least 90%, Step c: a step of applying Liquid B to a cured layer of the completely cured or semi-cured Liquid A, and Step d: a step of completely curing Liquid A and Liquid B.