The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 02, 2018

Filed:

Aug. 27, 2014
Applicant:

Korloy Inc., Seoul, KR;

Inventors:

Je-Hun Park, Chungcheongbuk-do, KR;

Seung-Su Ahn, Chungcheongbuk-do, KR;

Sung-Gu Lee, Chungcheongbuk-do, KR;

Seoun-Yong Ahn, Chungcheongbuk-do, KR;

Young Heum Kim, Chungcheongbuk-do, KR;

Assignee:

KORLOY INC., Seoul, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 28/04 (2006.01); B23B 27/14 (2006.01); C23C 14/06 (2006.01); C23C 28/00 (2006.01);
U.S. Cl.
CPC ...
B23B 27/14 (2013.01); C23C 14/0641 (2013.01); C23C 28/042 (2013.01); C23C 28/044 (2013.01); C23C 28/42 (2013.01); B23B 2224/24 (2013.01);
Abstract

Disclosed is a hard coating film formed on a hard base material such as cemented carbide. The hard coating film has a nanoscale multilayered structure to have improved oxidation resistance and wear resistance. The hard coating film is a hard coating film formed on the base material. The first layer is composed of a TiAl nitride having a composition of TiAl(0.3≦a≦0.7), and the second layer has a nanoscale multilayered structure or a structure in which the nanoscale multilayered structure is repeatedly laminated at least two times, the nanoscale multilayered structure including a thin layer A composed of an AlTiSi nitride, a thin layer B, a thin layer C composed of a AlCr nitride, and a thin layer D having thicknesses of 3 nm to 20 nm. The thin film B and the thin film D are composed of a TiAl nitride.


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