The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2018
Filed:
Apr. 27, 2015
Korea Institute of Science and Technology, Seoul, KR;
Jong Suk Lee, Seoul, KR;
Seung Sang Hwang, Seoul, KR;
Albert Sung Soo Lee, Seoul, KR;
Sunghwan Park, Seoul, KR;
Sang Hee Park, Seoul, KR;
Sanghyup Lee, Seoul, KR;
Korea Institute of Science and Technology, Seoul, KR;
Abstract
The present disclosure provides a gas separation membrane using a ladder-structured polysilsesquioxane in which organic functional groups are attached to a long siloxane chain and a method for fabricating the same. In accordance with the present disclosure, a free-standing ladder-structured polysilsesquioxane-based membrane with various functional groups can be fabricated for gas separations. The performance of the gas separation membrane can be controlled through a variety of combinations of the organic functional groups linked to the siloxane chain. In addition, by controlling the molecular structure of the gas separation membrane through mixing of the ladder-structured polysilsesquioxane with an amine compound or conventional glassy or rubbery polymers or through thermal/UV-curing, the permeability and selectivity of the gas separation membrane can be controlled selectively.