The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 19, 2017

Filed:

Nov. 19, 2015
Applicant:

Ion Beam Applications S.a., Louvain-la-Neuve, BE;

Inventors:

Willem Kleeven, Pellenberg, BE;

Eric Forton, Wallhain, BE;

Assignee:

ION BEAM APPLICATIONS S.A., Louvain-la-Neuve, BE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05H 13/00 (2006.01); H05H 7/10 (2006.01); G06F 17/50 (2006.01); H05H 7/08 (2006.01);
U.S. Cl.
CPC ...
H05H 13/005 (2013.01); G06F 17/50 (2013.01); H05H 7/10 (2013.01); H05H 2007/082 (2013.01);
Abstract

Cyclotron for accelerating charged particles around an axis, comprising an electromagnet with an upper pole and a lower pole, producing a magnetic field in the direction of said axis; a Dee electrode assembly and a counter Dee electrode assembly separated from each other by a gap for accelerating said charged particles and a pair of ion sources located in a central region of the cyclotron. Said ion sources are located at a distance of said axis such that the particles emitted from the first ion source pass between said first and second ion sources after a path of half a turn, and radially outwards of the second ion source after a path of three half-turns, and reciprocally.


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