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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9846373 B1

PDFFull Text
Date of Patent:
Dec. 19, 2017

Filed:

Jan. 15, 2016

High accuracy measurement system for focusing and leveling

Applicant:

The Institute of Optics and Electronics, the Chinese Academy of Sciences, Chengdu, Sichuan, CN;

Inventors:

Yanli Li, Sichuan, CN;

Wei Yan, Sichuan, CN;

Song Hu, Sichuan, CN;

Jian Wang, Sichuan, CN;

Jinhua Feng, Sichuan, CN;

Assignee:

The Institute of Optics and Electronics, The Chinese Academy of Sciences, Chengdu, Sichuan, CN;

Attorney:

Merchant & Gould P.C.

Primary Examiner:

Tri T Ton

Int. Cl.
CPC ...
G01B 11/14 (2006.01); G03F 7/20 (2006.01); G01B 11/22 (2006.01); G02B 5/30 (2006.01); G02B 27/10 (2006.01); G02B 27/42 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70641 (2013.01); G01B 11/22 (2013.01); G02B 5/3083 (2013.01); G02B 27/10 (2013.01); G02B 27/4255 (2013.01); G03F 9/7026 (2013.01);
Abstract

The present disclosure provides a high accuracy measurement system for focusing and leveling. The system determines an off-focus distance in the perpendicular direction within the exposure field and an inclination in the horizontal direction by measuring heights of four detection points on a substrate by using a four-channel detection method, thereby achieving focusing and leveling of the substrate. The detection of the substrate heights is implemented by a focusing method based on dual-channel light intensity modulation. Two superposed grating fringes are formed with phase difference of π/2. The shift can be resolved by the phase variation of corresponding fringes. According to the method, the off-focus distance can be derived. The present disclosure effectively eliminates the error due to the intensity changes caused by the fluctuations of the source or the reflectance of the substrate surface. The apparatus for focusing and leveling is easy to be implemented and has an accuracy of nanoscale.

Find Patent Forward Citations

Li, Yanli. (2017). High accuracy measurement system for focusing and leveling (U.S. Patent No. 9846373). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9846373

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