The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 2017
Filed:
Aug. 20, 2013
Hitachi, Ltd., Tokyo, JP;
Munesato Hamada, Tokyo, JP;
Shouichi Miyawaki, Tokyo, JP;
HITACHI, LTD., Tokyo, JP;
Abstract
To avoid discontinuities between echoes from becoming large level differences in a k-space and to reduce artifacts generated in a reconstructed image due to the discontinuities in the k-space, an MRI apparatus of the present invention uses phase characteristics of multiple echoes to be collected after a single RF excitation to control an arrangement order in the k-space where the multiple echoes are arranged when a pulse sequence of the fast spin echo method that collects the multiple echoes using a spin flip after a single RF excitation is executed. The arrangement is controlled so that echoes with small phase errors between the echoes at least near the center of the k-space are adjacent to each other.