The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 2017
Filed:
May. 07, 2015
Sharp Kabushiki Kaisha, Sakai, Osaka, JP;
Satoshi Inoue, Sakai, JP;
Katsuhiro Kikuchi, Sakai, JP;
Shinichi Kawato, Sakai, JP;
Takashi Ochi, Sakai, JP;
Yuhki Kobayashi, Sakai, JP;
Kazuki Matsunaga, Sakai, JP;
Eiichi Matsumoto, Mitsuke, JP;
Masahiro Ichihara, Mitsuke, JP;
SHARP KABUSHIKI KAISHA, Sakai, JP;
Abstract
A mask for a vapor deposition apparatus includes an outer frame; a first bar disposed on an inner side of the outer frame and fixed to the outer frame; and a pattern forming portion disposed on the outer frame and the first bar and fixed to the outer frame. The pattern forming portion includes a plurality of mask openings for pattern formation. Each of the plurality of mask openings is disposed along a first direction. The plurality of mask openings are disposed in a second direction orthogonal to the first direction. The first bar is positioned between adjacent two mask openings among the plurality of mask openings when viewed along a third direction orthogonal to the first direction and the second direction, and is in contact with the pattern forming portion.