The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 2017
Filed:
Feb. 13, 2017
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventor:
Jun Yamanobe, Kanagawa, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/165 (2006.01);
U.S. Cl.
CPC ...
B41J 2/16535 (2013.01);
Abstract
Provided are a wiping mechanism, a liquid droplet jetting apparatus, and a wiping method capable of preventing infiltration of bubbles into a nozzle when a nozzle surface is wiped by a wiping member. A wiping member () comes into contact with a nozzle surface () with a nozzle through which liquid droplets are jetted and is formed by weaving weft yarns () and warp yarns (), in which the wiping member () in which the weft yarns () are further exposed to the nozzle surface (A) side than the warp yarns () is moved relative to the nozzle surface (A) along the warp yarns ().