The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 2017
Filed:
Jan. 30, 2014
Applicant:
Apple Inc., Cupertino, CA (US);
Inventors:
Michael M. Li, San Jose, CA (US);
Anthony J. Richter, San Jose, CA (US);
Dale N. Memering, San Francisco, CA (US);
Assignee:
APPLE INC., Cupertino, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/00 (2014.01); B23K 26/12 (2014.01); B23K 26/38 (2014.01); B23K 26/142 (2014.01); B23K 26/402 (2014.01); B23K 103/16 (2006.01); B23K 103/00 (2006.01);
U.S. Cl.
CPC ...
B23K 26/125 (2013.01); B23K 26/142 (2015.10); B23K 26/38 (2013.01); B23K 26/402 (2013.01); B23K 2203/172 (2015.10); B23K 2203/50 (2015.10);
Abstract
A system and a method for manufacturing a sapphire part. A sapphire substrate is obtained for performing a laser cutting operation. The sapphire substrate is cut along a cut profile using a laser and a first gas medium. The first gas medium is substantially comprised of an inert gas. The sapphire substrate is then irradiated at or near the cut profile using the laser and a second gas medium. The second gas medium is different than the first gas medium comprising oxygen.