The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2017
Filed:
Dec. 28, 2015
Applicant:
Korea Institute of Science and Technology, Seoul, KR;
Inventors:
Young Min Jhon, Seoul, KR;
Yong Soo Kim, Seoul, KR;
Joon Mo Ahn, Seoul, KR;
Min Ah Seo, Seoul, KR;
Jae Hun Kim, Seoul, KR;
Min Chul Park, Seoul, KR;
Young Tae Byun, Seoul, KR;
Chul Ki Kim, Seoul, KR;
Seok Lee, Seoul, KR;
Deok Ha Woo, Seoul, KR;
Assignee:
KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY, Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05G 2/00 (2006.01);
U.S. Cl.
CPC ...
H05G 2/003 (2013.01); H05G 2/008 (2013.01);
Abstract
Provided is an extreme ultra-violet (EUV) beam generation apparatus using multi-gas cell modules in which a gas is prevented from directly flowing into a vacuum chamber by adding an auxiliary gas cell serving as a buffer chamber to a main gas cell, a diffusion rate of the gas is decreased, a high vacuum state is maintained, and a higher power EUV beam is continuously generated.