The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 12, 2017

Filed:

Jun. 14, 2016
Applicant:

Omnivision Technologies, Inc., Santa Clara, CA (US);

Inventor:

Xianmin Yi, Menlo Park, CA (US);

Assignee:

OmniVision Technologies, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 5/372 (2011.01); H01L 27/148 (2006.01); H04N 5/353 (2011.01); H04N 5/359 (2011.01); H04N 5/361 (2011.01);
U.S. Cl.
CPC ...
H04N 5/37213 (2013.01); H01L 27/14812 (2013.01); H01L 27/14831 (2013.01); H04N 5/3532 (2013.01); H04N 5/3597 (2013.01); H04N 5/361 (2013.01);
Abstract

An image sensor pixel having a hybrid transfer storage gate-storage diode storage node is disclosed herein. An example image sensor includes a photodiode, a storage diode, a transfer gate, and a buried storage well. The photodiode, storage diode, and buried storage well are all disposed in a semiconductor material. The transfer storage gate may be disposed on a surface of the semiconductor material between the photodiode and the storage diode. Further, the buried storage well may be disposed under the storage diode and partially under the transfer storage gate. Additionally, a length of the transfer storage gate and a length of the storage diode may be equal, and the storage diode may passivate a surface of the semiconductor material between the transfer storage gate and an output gate.


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