The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 12, 2017

Filed:

Oct. 25, 2016
Applicant:

Semiconductor Components Industries, Llc, Phoenix, AZ (US);

Inventors:

Shengling Deng, Chandler, AZ (US);

Zia Hossain, Tempe, AZ (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/66 (2006.01); H01L 29/10 (2006.01); H01L 29/40 (2006.01); H01L 29/423 (2006.01); H01L 29/06 (2006.01); H01L 29/417 (2006.01); H01L 29/739 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7813 (2013.01); H01L 29/063 (2013.01); H01L 29/1095 (2013.01); H01L 29/407 (2013.01); H01L 29/41766 (2013.01); H01L 29/4236 (2013.01); H01L 29/42368 (2013.01); H01L 29/66348 (2013.01); H01L 29/66666 (2013.01); H01L 29/66734 (2013.01); H01L 29/7397 (2013.01); H01L 29/0623 (2013.01);
Abstract

A semiconductor device includes a semiconductor region with a charge balance region on a junction blocking region, the junction blocking region having a lower doping concentration. The junction blocking region extends between a pair of trench structures in cross-sectional view. The trench structures are provided in the semiconductor region and include at least one insulated electrode. In some embodiments, the semiconductor device further includes a first doped region disposed between the pair of trench structures. The semiconductor device may further include one or more features configured to improve operating performance. The features include a localized doped region adjoining a lower surface of a first doped region and spaced apart from the trench structure, a notch disposed proximate to the lower surface of the first doped region, and/or the at least one insulated electrode configured to have a wide portion adjoining a narrow portion.


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