The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 12, 2017

Filed:

Apr. 17, 2015
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-Do, KR;

Inventors:

Dae-Kwon Kang, Yongin-si, KR;

Jae-Seok Yang, Hwaseong-si, KR;

Sung-Wook Hwang, Gyeongsangbuk-Do, KR;

Dong-Gyun Kim, Seoul, KR;

Ji-Young Jung, Hwaseong-si, KR;

Assignee:

SAMSUNG ELECTRONICS CO., LTD., Suwon-si, Gyeonggi-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 1/70 (2012.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 1/70 (2013.01); G03F 7/70433 (2013.01); G03F 7/70466 (2013.01);
Abstract

A method of decomposing a layout of a semiconductor device for a quadruple patterning technology (QPT) process includes dividing the layout of the semiconductor device into a first temporary pattern, which includes rectangular features having a rectangular shape, and a second temporary pattern, which includes cross couple features having a Z-shape, generating a third temporary pattern and a fourth temporary pattern by performing a pattern dividing operation on the first temporary pattern in a first direction, generating a first target pattern and a second target pattern by incorporating each of the cross couple features included in the second temporary pattern into one of the third temporary pattern and the fourth temporary pattern, and generating first through fourth decomposed patterns by performing the pattern dividing operation on the first target pattern and the second target pattern in a second direction.


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