The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 12, 2017

Filed:

Dec. 31, 2013
Applicant:

3m Innovative Properties Company, St. Paul, MN (US);

Inventors:

Andrew J. Ouderkirk, St. Paul, MN (US);

Erin A. Binder, Afton, MN (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 5/30 (2006.01); G02B 27/28 (2006.01); G02B 27/01 (2006.01); G02B 27/14 (2006.01); G02B 1/04 (2006.01); G02B 5/28 (2006.01);
U.S. Cl.
CPC ...
G02B 27/0172 (2013.01); G02B 5/28 (2013.01); G02B 27/142 (2013.01); G02B 27/283 (2013.01); G02B 1/041 (2013.01); G02B 5/287 (2013.01); G02B 5/305 (2013.01); G02B 2027/0178 (2013.01);
Abstract

A lens is formed from at least two sections or bodies that are shaped to mate with each other, and a multilayer optical film is sandwiched between these two sections. Smooth surfaces of each section combine to provide a first optical surface of the lens, e.g., a concave, convex, or flat optical surface. The multilayer optical film includes a stack of polymer layers configured to selectively reflect light by constructive or destructive interference, at least some of the polymer layers being birefringent. The multilayer optical film may thus be or comprise e.g. a reflective polarizer and/or a narrow band or otherwise notched reflector. The multilayer optical film has an extended terminus that separates the smooth surfaces of the two sections. Any edge defects such as cracks or delaminations that may exist along the extended terminus are characterized by an average defect distance of no more than 100 or 50 microns.


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