The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2017
Filed:
Mar. 24, 2017
Fujifilm Corporation, Tokyo, JP;
Hiroki Takahashi, Saitama, JP;
Takeshi Iida, Sano, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided is an antireflection film having excellent abrasion resistance. In the antireflection film, a hydrogenated carbon film as a first layer is formed on a surface of an optical substrate. A MgFfilm as a second layer having a lower refractive index than the first layer is formed on the first layer. Likewise, a third layer formed of the hydrogenated carbon film, a fourth layer formed of the MgFfilm, and a fifth layer formed of the hydrogenated carbon film are formed. During the formation of the hydrogenated carbon film, a mixed gas of argon and hydrogen is supplied to a vacuum chamber such that some of C—C bonds in the film are replaced with C—H bonds. Due to the C—H bonds, an antireflection film having excellent abrasion resistance and adhesiveness and having a low refractive index can be obtained.