The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2017
Filed:
Aug. 10, 2015
Decision Sciences International Corporation, Poway, CA (US);
Gary Blanpied, Ramona, CA (US);
Sankaran Kumar, San Marcos, CA (US);
Dustin Dorroh, Ramona, CA (US);
Craig Morgan, El Cajon, CA (US);
Decision Sciences International Corporation, Poway, CA (US);
Abstract
In one aspect, a process for characterizing a range of materials based on the scattering and stopping of incident cosmic ray charged particles passing through each material includes: determining a scattering metric and a stopping metric for each material within the range of materials exposed to cosmic ray charged particles; computing a ratio of the scattering metric to the stopping metric to obtain a scattering-to-stopping ratio for each material within the range of materials for the material; and establishing a scattering-stopping relationship for the range of materials based on the determined pairs of the scattering-to-stopping ratio and the associated scattering metric for the range of materials.