The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2017
Filed:
Dec. 22, 2009
Shouji Iiyama, Shunan, JP;
Tomohiro Yamamoto, Shunan, JP;
Yukihiro Takata, Shunan, JP;
Shinichirou Koyanagi, Shunan, JP;
Kanji Sakata, Shunan, JP;
Shouji Iiyama, Shunan, JP;
Tomohiro Yamamoto, Shunan, JP;
Yukihiro Takata, Shunan, JP;
Shinichirou Koyanagi, Shunan, JP;
Kanji Sakata, Shunan, JP;
TOKUYAMA CORPORATION, Shunan-Shi, Yamaguchi, JP;
Abstract
When a disproportionated chlorosilane is to be produced by causing a starting material chlorosilane liquid to flow through a catalyst-packed layer which is packed with a weakly basic anion exchange resin as a disproportionation reaction catalyst to carry out a disproportionation reaction, before the disproportionation reaction is carried out, the disproportionation reaction catalyst is brought into contact with a processing gas obtained by diluting a chlorosilane with an inert gas to prevent the deterioration of the disproportionation reaction catalyst at the start of the reaction so as to carry out the disproportionation of the chlorosilane efficiently.