The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 12, 2017

Filed:

Apr. 17, 2013
Applicant:

Bobst Mex SA, Mex, CH;

Inventors:

Christophe Carron, Carrouge, CH;

Christophe Steiner, Crissier, CH;

Roberto Valterio, Olllon, CH;

Dieudonné Ngoy-Muvumbu, Renens, CH;

Assignee:

BOBST MEX SA, , CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B31F 1/07 (2006.01); B31B 50/62 (2017.01); B41J 3/32 (2006.01); B31B 50/88 (2017.01);
U.S. Cl.
CPC ...
B31F 1/07 (2013.01); B31B 50/62 (2017.08); B41J 3/32 (2013.01); B31B 50/88 (2017.08); B31F 2201/0753 (2013.01); Y10T 29/49716 (2015.01);
Abstract

A radial spacing, between two rotating cylindrical embossing tools, is adjustable, in an embossing device () having: an armature (); a first structure () which is movably mounted in translation relative to the armature (), which has a first rotating cylindrical tool (); a second structure () mounted in a fixed manner on the armature () and which is provided with a second rotating cylindrical tool (). A method includes steps of: pushing (T) on the first structure to move it closer to the second structure by leaning on the armature () to adjust a radial space, or pulling (P) on the first structure () in order to move it away from the second structure () by leaning on the armature () in order to finely adjust the radial spacing between the first and the second tools ().


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