The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 05, 2017

Filed:

Feb. 10, 2014
Applicant:

Thales, Courbevoie, FR;

Inventors:

Mane-Si Laure Lee-Bouhours, Les Molieres, FR;

Antoine Brus, Sceaux, FR;

Brigitte Loiseaux, Bures-sur-Yvette, FR;

Thierry Dousset, Saint-Gratien, FR;

Christian Renard, Boulogne Billancourt, FR;

Assignee:

THALES, Courbevoie, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01Q 15/10 (2006.01); H01Q 3/14 (2006.01);
U.S. Cl.
CPC ...
H01Q 15/10 (2013.01); H01Q 3/14 (2013.01);
Abstract

A configurable deflection system for an incident microwave frequency beam exhibiting a wavelength contained in a band of wavelengths corresponding to the microwave frequencies, comprising: a first and a second diffractive dielectric component suitable for each performing a rotation about a rotation axis Z, the deflection system being suitable for generating a microwave frequency beam by diffraction of the incident microwave frequency beam on the first and second components, the microwave frequency beam being oriented according to an angle that is a function of the angular positioning between the first and said second diffractive components, the first and second components respectively exhibiting a first and second periodic structure of first and second periods according to a first and second axis, the first and second structures respectively comprising a plurality of first and second primary microstructures formed respectively on a first and second substrate of first and second substrate refractive indices.


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