The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 05, 2017

Filed:

Dec. 13, 2016
Applicant:

Industrial Technology Research Institute, Hsinchu, TW;

Inventors:

Chih-Chia Chang, Hsinchu County, TW;

Cheng-Chung Lee, Hsinchu, TW;

Kuang-Jung Chen, Hsinchu County, TW;

Kai-Ming Chang, New Taipei, TW;

Jui-Chang Chuang, Kaohsiung, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/52 (2006.01); H01L 27/32 (2006.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
H01L 51/5256 (2013.01); H01L 27/322 (2013.01); H01L 27/3272 (2013.01); H01L 51/004 (2013.01); H01L 51/5284 (2013.01);
Abstract

A protective structure includes an impact resistant structure and an anti-scratch structure. The impact resistant structure includes a plurality of buffer structures and a plurality of filling structures located around the buffer structures. The anti-scratch structure is located over the impact resistant structure. The anti-scratch structure includes a hard coat layer which covers the impact resistant structure, and a surface anti-scratch layer which covers the hard coat layer.


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