The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 05, 2017

Filed:

May. 27, 2016
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Werner Schwetlick, Groebenzell, DE;

Robert Zink, Riegersdorf, AT;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/40 (2006.01); H01L 29/66 (2006.01); H01L 29/739 (2006.01); H01L 29/423 (2006.01); H01L 29/10 (2006.01); H01L 29/78 (2006.01); H01L 29/06 (2006.01); H01L 27/092 (2006.01);
U.S. Cl.
CPC ...
H01L 29/407 (2013.01); H01L 29/1095 (2013.01); H01L 29/401 (2013.01); H01L 29/408 (2013.01); H01L 29/4238 (2013.01); H01L 29/42368 (2013.01); H01L 29/66734 (2013.01); H01L 29/739 (2013.01); H01L 29/7397 (2013.01); H01L 29/7813 (2013.01); H01L 27/0922 (2013.01); H01L 29/0696 (2013.01);
Abstract

A semiconductor device includes a stripe-shaped electrode structure that extends from a first surface into a semiconductor portion. The electrode structure includes a main portion and an end portion terminating the electrode structure. The main portion includes a field electrode and a first portion of a field dielectric separating the field electrode from the semiconductor portion. The end portion includes a filled section in which a second portion of the field dielectric extends from a first side of the electrode structure to an opposite second side. The filled section is narrower than the main portion and a length of the filled section along a longitudinal axis of the electrode structure is at least 150% of a first layer thickness of the first portion of the field dielectric.


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