The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2017
Filed:
Dec. 18, 2012
Sumitomo Osaka Cement Co., Ltd., Tokyo, JP;
Sumitomo Osaka Cement Co., Ltd., Tokyo, JP;
Abstract
An electrostatic chuck apparatus is disclosed which can be prevented from being damaged or fractured when the temperature abruptly increases or decreases when plasma is irradiated on a plate-like specimen, the heater is heated, or the like, and can also prevent corrosion when a corrosive gas or plasma is provided. The electrostatic chuck apparatus has an electrostatic chuck portionhaving a mounting platemade of a corrosion-resistant ceramic, a supporting platewhich is integrated with the mounting plateso as to support the mounting plateand is made of an insulating ceramic having a larger thermal conductivity than the thermal conductivity of the corrosion-resistant ceramic, and an internal electrode for electrostatic adsorptionprovided between the mounting plateand the supporting plate; and a temperature-controlling base portionwhich adjusts the electrostatic chuck portionto a desired temperature.