The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 05, 2017

Filed:

Jun. 06, 2016
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Atsushi Azuma, Cortlandt Manor, NY (US);

Yuping Cui, Fishkill, NY (US);

James A. Culp, New Paltz, NY (US);

Marco Facchini, Wappingers Falls, NY (US);

Shaoning Yao, Wappingers Falls, NY (US);

Assignee:

GLOBALFOUNDRIES INC., Grand Cayman, KY;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5072 (2013.01); G06F 17/5081 (2013.01);
Abstract

Semiconductor layout generation includes: calculating, for a design rule constraint, a slack value for a subset of elements of a proposed semiconductor layout; generating a plurality of alternative layouts, where each of the alternative layouts includes a variation of interdependent characteristics of the subset of elements and a slack value for the subset of elements of each of the alternative layouts is less than the calculated slack value of subset of elements of the proposed layout; and calculating, by the layout design module for each of the alternative layouts, a risk value indicating the alternative layout's risk of fabrication failure.


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