The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 05, 2017

Filed:

Mar. 09, 2016
Applicants:

Deng-ke Yang, Hudson, OH (US);

Yue Cui, Kent, OH (US);

Cuiyu Zhang, Kent, OH (US);

Inventors:

Deng-Ke Yang, Hudson, OH (US);

Yue Cui, Kent, OH (US);

Cuiyu Zhang, Kent, OH (US);

Assignee:

Kent State University, Kent, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1333 (2006.01); G02F 1/1334 (2006.01); B05D 5/06 (2006.01); G02F 1/1343 (2006.01); G02F 1/137 (2006.01);
U.S. Cl.
CPC ...
G02F 1/1334 (2013.01); B05D 5/065 (2013.01); G02F 1/137 (2013.01); G02F 1/13439 (2013.01); G02F 2001/13775 (2013.01);
Abstract

An encapsulated polymer stabilized cholesteric texture (EPSCT) light shutter is formed from a cholesteric liquid crystal and monomer that is encapsulated into micron sized, polymer-coated droplets by either an emulsification or phase separation process. The polymer-coated droplets are disposed between transparent electrodes, where they are irradiated by ultra-violet (UV) light to polymerize the monomer.


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