The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2017
Filed:
Jul. 02, 2013
Commissariat a L'energie Atomique ET Aux Energies Alternatives, Paris, FR;
Olivier Dellea, La Talaudiere, FR;
Pascal Fugier, Bernin, FR;
Helene Marie, Fontaine, FR;
Severine Vignoud, Bernin, FR;
Abstract
The invention concerns a method for producing a chromatography analysis column, the resulting column, and a device comprising such a column. The method according to the invention comprises the following steps: (a) depositing on the flat surface of a substrate a first layer of particles which are intended to form the stationary phase; (b) depositing on the layer at least one second layer of compactly assembled particles; (c) impregnating the first and second layers with a light radiation-sensitive material, to form at least two compactly assembled particle layers impregnated with sensitive material; (d) insolating these layers in the regions corresponding to the desired internal shape of the chromatography analysis column, if the light radiation-sensitive material behaves like a positive resin, or outlining this internal shape if the light radiation-sensitive material behaves like a negative photosensitive resin; (e) eliminating either the regions insolated in step (d) if the light radiation-sensitive layer behaves like a positive photosensitive resin, or the regions not insolated in step (d) if the light radiation-sensitive material behaves like a negative photosensitive resin; and (f) covering and sealing the structure obtained in step (e) with a cover covered on the face facing the layers with at least one layer of compactly assembled particles which are identical to or different from those deposited on the substrate surface. The invention is used in particular in the field of chemical analysis.